半绝缘GaAs的铸锭和晶片退火效应的光致发光研究

O. Ka, O. Oda, Y. Makita, A. Yamada
{"title":"半绝缘GaAs的铸锭和晶片退火效应的光致发光研究","authors":"O. Ka, O. Oda, Y. Makita, A. Yamada","doi":"10.1109/SIM.1992.752685","DOIUrl":null,"url":null,"abstract":"Photoluminescence spectroscopy is used to characterize semi-insulating Czochralski-grown GaAs. The spectra show the differences induced by the different post growth annealing procedures, i.e. ingot- or wafer-annealing, single- or multi-step. The wafer annealing techniques definitely lead to an improvement of the crystalline quality, while ingot annealed crystals present additional defect related-emissions. For multi-step ingot-annealed crystals, two transitions around 1.45 eV are identified with the (e,A/spl ring/) and the (D/spl ring/,A/spl ring/) recombinations of an acceptor-like defect, different from the 78-meV double acceptor. On the other hand, wafer-annealed crystals present much lower concentrations of background impurities, as estimated by selective pair luminescence.","PeriodicalId":368607,"journal":{"name":"Proceedings of the 7th Conference on Semi-insulating III-V Materials,","volume":"16 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1992-04-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Photolumineseence investigation of ingot- and wafer-annealing effects on semi-insulating GaAs\",\"authors\":\"O. Ka, O. Oda, Y. Makita, A. Yamada\",\"doi\":\"10.1109/SIM.1992.752685\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Photoluminescence spectroscopy is used to characterize semi-insulating Czochralski-grown GaAs. The spectra show the differences induced by the different post growth annealing procedures, i.e. ingot- or wafer-annealing, single- or multi-step. The wafer annealing techniques definitely lead to an improvement of the crystalline quality, while ingot annealed crystals present additional defect related-emissions. For multi-step ingot-annealed crystals, two transitions around 1.45 eV are identified with the (e,A/spl ring/) and the (D/spl ring/,A/spl ring/) recombinations of an acceptor-like defect, different from the 78-meV double acceptor. On the other hand, wafer-annealed crystals present much lower concentrations of background impurities, as estimated by selective pair luminescence.\",\"PeriodicalId\":368607,\"journal\":{\"name\":\"Proceedings of the 7th Conference on Semi-insulating III-V Materials,\",\"volume\":\"16 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1992-04-21\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings of the 7th Conference on Semi-insulating III-V Materials,\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/SIM.1992.752685\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of the 7th Conference on Semi-insulating III-V Materials,","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SIM.1992.752685","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

采用光致发光光谱法对半绝缘齐克拉尔斯基生长砷化镓进行了表征。光谱显示了不同的生长后退火工艺所引起的差异,即锭退火或片退火,单步退火或多步退火。晶圆退火技术确实可以改善晶体质量,而锭退火晶体则存在额外的缺陷-发射。对于多步锭退火晶体,与78-meV双受体缺陷不同的是,在1.45 eV左右的两个转变被鉴定为(e,A/spl环/)和(D/spl环/,A/spl环/)类受体缺陷的重组。另一方面,晶圆退火晶体呈现出低浓度的背景杂质,通过选择性对发光估计。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Photolumineseence investigation of ingot- and wafer-annealing effects on semi-insulating GaAs
Photoluminescence spectroscopy is used to characterize semi-insulating Czochralski-grown GaAs. The spectra show the differences induced by the different post growth annealing procedures, i.e. ingot- or wafer-annealing, single- or multi-step. The wafer annealing techniques definitely lead to an improvement of the crystalline quality, while ingot annealed crystals present additional defect related-emissions. For multi-step ingot-annealed crystals, two transitions around 1.45 eV are identified with the (e,A/spl ring/) and the (D/spl ring/,A/spl ring/) recombinations of an acceptor-like defect, different from the 78-meV double acceptor. On the other hand, wafer-annealed crystals present much lower concentrations of background impurities, as estimated by selective pair luminescence.
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