极端热应力条件下0.18μm CMOS对BTI和HCI机制的灵敏度研究

Yen Tran, T. Nomura, Mohamed Salim Cherchali, C. Tassin, Y. Deval, C. Maneux
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引用次数: 1

摘要

偏置温度不稳定性(BTI)和热载流子注入(HCI)都是集成电路(ic)的主要可靠性问题。在本文中,我们研究了0.18μm CMOS(互补金属氧化物半导体)在高温(150°C和210°C)下长时间应力(长达2000小时)的失效机制。此外,在特定的应力条件下,晶体管激活了固有的HCI和BTI磨损机制。基于这些实验结果提出了老化规律,并将其实现到商业软件工具中,以便在逻辑电路层面进行进一步的研究。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Investigation of 0.18μm CMOS Sensitivity to BTI and HCI Mechanisms under Extreme Thermal Stress Conditions
Bias temperature instability (BTI) and hot carrier injection (HCI) are both prominent reliability concerns for integrated circuits (ICs). In this paper, we investigated these failure mechanisms on 0.18μm CMOS (Complementary Metal-Oxide-Semiconductor) submitted to severe temperatures (150°C and 210°C) for long period of stress (up to 2,000 hours). Additionally, the transistors were applied dedicated stress conditions to activate the intrinsic HCI and BTI wear-out mechanisms. The aging laws were proposed based on these experimental results and implemented into the commercial software tool for further investigation at logic circuit level.
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