Ho-sung Jang, Yu-sung Kim, Dae-Jam Choi, Jae-Young Lee, Jihong Park, Jong-In Choi, B. Choi, Y. You, H. Chun, D. Kim
{"title":"电感耦合等离子体辅助射频磁控溅射镀氮化铬","authors":"Ho-sung Jang, Yu-sung Kim, Dae-Jam Choi, Jae-Young Lee, Jihong Park, Jong-In Choi, B. Choi, Y. You, H. Chun, D. Kim","doi":"10.1109/IFOST.2006.312331","DOIUrl":null,"url":null,"abstract":"Chromium nitride (CrN) films were deposited by using inductively coupled plasma (ICP) assisted RF magnetron sputtering to investigate the effect of substrate bias voltage on the hardness, surface morphology roughness, and crystalline growth on Si(100) substrate. As increasing substrate bias voltage (Vb), surface hardness increased from 5 to 15 GPa. The grain size also increased proportionally as increasing Vb from -30 to -80, while beyond -80 Vb, the grain size was deteriorated by an intense N+ion bombardment.","PeriodicalId":103784,"journal":{"name":"2006 International Forum on Strategic Technology","volume":"6 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2006-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Chromium Nitride Coating by Inductively Coupled Plasma-assisted RF Magnetron Sputtering\",\"authors\":\"Ho-sung Jang, Yu-sung Kim, Dae-Jam Choi, Jae-Young Lee, Jihong Park, Jong-In Choi, B. Choi, Y. You, H. Chun, D. Kim\",\"doi\":\"10.1109/IFOST.2006.312331\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Chromium nitride (CrN) films were deposited by using inductively coupled plasma (ICP) assisted RF magnetron sputtering to investigate the effect of substrate bias voltage on the hardness, surface morphology roughness, and crystalline growth on Si(100) substrate. As increasing substrate bias voltage (Vb), surface hardness increased from 5 to 15 GPa. The grain size also increased proportionally as increasing Vb from -30 to -80, while beyond -80 Vb, the grain size was deteriorated by an intense N+ion bombardment.\",\"PeriodicalId\":103784,\"journal\":{\"name\":\"2006 International Forum on Strategic Technology\",\"volume\":\"6 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2006-10-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2006 International Forum on Strategic Technology\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IFOST.2006.312331\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2006 International Forum on Strategic Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IFOST.2006.312331","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Chromium Nitride Coating by Inductively Coupled Plasma-assisted RF Magnetron Sputtering
Chromium nitride (CrN) films were deposited by using inductively coupled plasma (ICP) assisted RF magnetron sputtering to investigate the effect of substrate bias voltage on the hardness, surface morphology roughness, and crystalline growth on Si(100) substrate. As increasing substrate bias voltage (Vb), surface hardness increased from 5 to 15 GPa. The grain size also increased proportionally as increasing Vb from -30 to -80, while beyond -80 Vb, the grain size was deteriorated by an intense N+ion bombardment.
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