面向未来技术节点的新型行业标准FinFET紧凑模型

S. Khandelwal, J. Duarte, A. Medury, Y. Chauhan, C. Hu
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引用次数: 14

摘要

提出了一种新的可用于未来finfet生产的紧凑型模型。这种单一的统一模型可以模拟具有逼真鳍形的finfet,包括矩形,三角形,圆形和两者之间的任何形状。新的迁移率模型支持Ge p- finfet和InGaAs n- finfet。新的量子效应模型使III-V finfet的精确建模成为可能。特别关注了侵略性Lg缩放的形状不可知短通道效应模型和大块基板上finfet的体偏置模型。通过实验数据和TCAD验证了该模型的准确性,该模型计算效率高,是未来异构电路仿真和设计的理想解决方案。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
New industry standard FinFET compact model for future technology nodes
A new production ready compact model for future FinFETs is presented. This single unified model can model FinFETs with realistic fin shapes including rectangle, triangle, circle and any shape in between. New mobility models support Ge p-FinFETs and InGaAs n-FinFETs. A new quantum effects model enables accurate modeling of III-V FinFETs. Special attention is paid to shape agnostic short-channel effect model for aggressive Lg scaling and body bias model for FinFETs on bulk substrates. With its accuracy verified with experimental data and TCAD, this computationally efficient model is an ideal turn-key solution for simulation and design of future heterogeneous circuits.
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