原子-分子化学组装“纳米多孔二氧化硅-二氧化钛”组合物多孔表面的平面化

2016 14th International Baltic Conference on Atomic Layer Deposition (BALD) Pub Date : 2016-10-01 DOI:10.1109/BALD.2016.7886522

V. Luchinin, M. Panov, A. A. Romanov

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引用次数: 0

摘要

采用不同模式的原子-分子层沉积法制备了纳米多孔SiO2的表面平面化。利用椭偏仪控制TiO2在SiO2纳米孔中的渗透。

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Planarization of the porous surface of composition “nanoporous silicon dioxide - titanium dioxide” by atomic-molecular chemical assembly

The surface planarization of nanoporous SiO2 is made by method of atomic-molecular layer deposition of TiO2 nanofilm in different modes. A penetration of TiO2 in nano-pores of SiO2 is controlled by ellipsometry.

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2016 14th International Baltic Conference on Atomic Layer Deposition (BALD)

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