等离子体化学喷射法沉积非晶硅薄膜的光学性质

V. Strunin, L. V. Baranova, A. A. Lyahov, V. Popov, G. J. Hudaybergenov, S. Jacob
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引用次数: 1

摘要

讨论了等离子体化学射流沉积非晶硅薄膜的方法。分析了薄膜的光学性质。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Optical properties of amorphous silicon thin films deposited by plasma chemical jet method
Plasma chemical jet method for deposition of amorphous silicon films is discussed. Optical properties of films are analyzed.
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