硫脲和明胶对锡银焊料合金电沉积的影响

Lee Wei, A. Haseeb, G. Yingxin
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引用次数: 6

摘要

研制了硫酸基锡银镀液,研究了硫脲(TU)和明胶对锡银镀层特征的单独和协同作用。采用阴极极化法研究了各镀液的电化学行为。结果表明,两种添加剂均减小了两种元素的沉积电位间隙,从而使Sn-Ag的共沉积得以发生。在本研究中,TU增加了Ag的组成,改变了镀层的微观结构。低含量明胶抑制银沉积,高含量明胶促进银沉积。两种添加剂的协同作用改善了镀层的显微组织。在电流密度为10mA cm-2的情况下,加入2g/L的TU和1g/L的明胶,可以获得Sn-4.0 wt.% Ag的近共晶成分。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Effects of thiourea and gelatin on the electrodeposition of Sn-Ag solder alloy
Sulfuric acid based Sn-Ag plating baths were developed to study the individual as well as synergistic effects of thiourea (TU) and gelatin on the characteristics of Sn-Ag deposits. Electrochemical behavior of each bath was investigated by cathodic polarization studies. Results showed that the deposition potential gap of both elements was reduced by both additives, hence allowing co-deposition of Sn-Ag to occur. In this study, TU increases Ag composition and changes deposits microstructure. Low content of gelatin inhibits Ag deposition but high content of gelatin results in enhanced Ag deposition. Microstructure of deposits has been improved by the synergistic effects of these two additives. Near-eutectic composition of Sn-4.0 wt.% Ag is achieved with the aid of 2g/L of TU and 1g/L of gelatin at a current density of 10mA cm-2.
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