{"title":"蒸馏过程的严格动力学模型及其应用","authors":"Xuemei Zhu","doi":"10.1109/ICCA.2010.5524130","DOIUrl":null,"url":null,"abstract":"In this paper, the rigorous dynamic model of a distillation process is proposed to realize its dynamic optimization and advanced control. In the rigorous model, the component compositions of vapour and liquid phases, the vapour and liquid flow rates, the temperature, pressure, and liquid holdup are state variables of each tray. The rigorous model is a set of nonlinear differential and algebraic equations (DAEs) which is solved by conventional Newton-Raphson algorithm with orthogonal collocation discretization. The proposed model is with high precision and its maximum error is less than 3%.The model can be applied to further study of dynamic optimization and advanced control of distillation processes.","PeriodicalId":155562,"journal":{"name":"IEEE ICCA 2010","volume":"91 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2010-06-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Rigorous dynamic model of a distillation process and its application\",\"authors\":\"Xuemei Zhu\",\"doi\":\"10.1109/ICCA.2010.5524130\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this paper, the rigorous dynamic model of a distillation process is proposed to realize its dynamic optimization and advanced control. In the rigorous model, the component compositions of vapour and liquid phases, the vapour and liquid flow rates, the temperature, pressure, and liquid holdup are state variables of each tray. The rigorous model is a set of nonlinear differential and algebraic equations (DAEs) which is solved by conventional Newton-Raphson algorithm with orthogonal collocation discretization. The proposed model is with high precision and its maximum error is less than 3%.The model can be applied to further study of dynamic optimization and advanced control of distillation processes.\",\"PeriodicalId\":155562,\"journal\":{\"name\":\"IEEE ICCA 2010\",\"volume\":\"91 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2010-06-09\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"IEEE ICCA 2010\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICCA.2010.5524130\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE ICCA 2010","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICCA.2010.5524130","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Rigorous dynamic model of a distillation process and its application
In this paper, the rigorous dynamic model of a distillation process is proposed to realize its dynamic optimization and advanced control. In the rigorous model, the component compositions of vapour and liquid phases, the vapour and liquid flow rates, the temperature, pressure, and liquid holdup are state variables of each tray. The rigorous model is a set of nonlinear differential and algebraic equations (DAEs) which is solved by conventional Newton-Raphson algorithm with orthogonal collocation discretization. The proposed model is with high precision and its maximum error is less than 3%.The model can be applied to further study of dynamic optimization and advanced control of distillation processes.
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