{"title":"交错碳阻挡层Mo/Si多层EUV反射镜的耐热性","authors":"H. Takenaka, T. Kawamura, T. Haga","doi":"10.1364/eul.1996.rmc169","DOIUrl":null,"url":null,"abstract":"Introducing interleaved carbon barrier-layers improves the heat resistance of Mo/Si multilayers . The soft x-ray reflectivities of the multilayers were calculated, and the effects of heating on both the reflectivities and layer structures of Mo/C/Si/C and Mo/Si multilayers were investigated using x-ray diffraction and transmission electron microscopy. The results show that, for applications using intense soft x-ray beams, Mo/Si multilayers with interleaved carbon barrier-layers are better mirrors than Mo/Si multilayers because they have much better heat resistance and almost the same EUV reflectivity.","PeriodicalId":201185,"journal":{"name":"Extreme Ultraviolet Lithography (TOPS)","volume":"118 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Heat-Resistance of Mo/Si Multilayer EUV Mirrors with Interleaved Carbon Barrier-Layers\",\"authors\":\"H. Takenaka, T. Kawamura, T. Haga\",\"doi\":\"10.1364/eul.1996.rmc169\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Introducing interleaved carbon barrier-layers improves the heat resistance of Mo/Si multilayers . The soft x-ray reflectivities of the multilayers were calculated, and the effects of heating on both the reflectivities and layer structures of Mo/C/Si/C and Mo/Si multilayers were investigated using x-ray diffraction and transmission electron microscopy. The results show that, for applications using intense soft x-ray beams, Mo/Si multilayers with interleaved carbon barrier-layers are better mirrors than Mo/Si multilayers because they have much better heat resistance and almost the same EUV reflectivity.\",\"PeriodicalId\":201185,\"journal\":{\"name\":\"Extreme Ultraviolet Lithography (TOPS)\",\"volume\":\"118 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1900-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Extreme Ultraviolet Lithography (TOPS)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1364/eul.1996.rmc169\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Extreme Ultraviolet Lithography (TOPS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/eul.1996.rmc169","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Heat-Resistance of Mo/Si Multilayer EUV Mirrors with Interleaved Carbon Barrier-Layers
Introducing interleaved carbon barrier-layers improves the heat resistance of Mo/Si multilayers . The soft x-ray reflectivities of the multilayers were calculated, and the effects of heating on both the reflectivities and layer structures of Mo/C/Si/C and Mo/Si multilayers were investigated using x-ray diffraction and transmission electron microscopy. The results show that, for applications using intense soft x-ray beams, Mo/Si multilayers with interleaved carbon barrier-layers are better mirrors than Mo/Si multilayers because they have much better heat resistance and almost the same EUV reflectivity.
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