NPN失配依赖于布局

2018 IEEE International Conference on Microelectronic Test Structures (ICMTS) Pub Date : 2018-03-01 DOI:10.1109/ICMTS.2018.8383774

Cory Compton

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引用次数: 1

摘要

不匹配结构通常设计用于查看具有接近理想布局的相同设备对。本文研究了两种0.18um SiGe BiCMOS工艺中取向和NPN密度对NPN失配结果的影响。不匹配结构被添加到scribeline PCM模块中，这使我们能够查看多个掩码集的结果。

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NPN mismatch dependence on layout

Mismatch structures are normally designed to look at pairs of identical devices with near ideal layouts. In this paper we look into the effects of orientation and NPN density on the mismatch results of NPNs in two 0.18um SiGe BiCMOS process. The mismatch structures were added to scribeline PCM modules, which allowed us to look at the results from multiple mask sets.

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来源期刊

2018 IEEE International Conference on Microelectronic Test Structures (ICMTS)

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