用于浸没光刻的超纯水

The 17th Annual SEMI/IEEE ASMC 2006 Conference Pub Date : 2006-05-22 DOI:10.1109/ASMC.2006.1638751

M.E. Clarke, A. Xia, J. Smith, B. Parekh

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引用次数: 2

摘要

在本文中，我们描述了用于浸入式应用的使用点UPW(超纯水)组件和系统的设计和开发。本文阐述了浸没式光刻工艺的水质要求，介绍了主要的污染物去除技术和效果。POU输水系统是根据个别客户的需求设计的

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Point-of-Use Ultra-Pure Water for Immersion Lithography

In this paper we describe the design and development of point-of-use UPW (ultra pure water) components and systems for the immersion application. The paper addresses the water quality needs for the immersion lithography process and presents key contaminant removal techniques and performance results. POU water delivery systems are designed based upon individual customer needs

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The 17th Annual SEMI/IEEE ASMC 2006 Conference

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