利用选择性区域化学束外延将光放大器和无源波导器件集成到InP上

P. Harmsma, M. Leys, C. Verschuren, H. Vonk, M. Smit, Y. Oei
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引用次数: 3

摘要

采用选择性区域化学束外延(SA-CBE)再生步骤,在InGaAsP系统中制备了高质量的对接接头。相似透明层之间对接的耦合损耗低至0.1 dB/接口。使用SA-CBE在单个芯片上定义有源和无源区域。在相应的区域制备了半导体光放大器和透明波导。在1.56 /spl mu/m波长下,由两侧有无源波导的soa组成的扩展腔激光器表现出稳定的连续工作。SA-CBE提供了最大的设计灵活性,因为每个器件都可以在自己的优化层堆栈中制造。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Integration of optical amplifiers and passive waveguide devices on InP using selective area chemical beam epitaxy
High quality butt joints were fabricated in the InGaAsP system using a Selective Area Chemical Beam Epitaxy (SA-CBE) regrowth step. Coupling losses were as low as 0.1 dB/interface for butt joints between similar transparent layer stacks. Active and passive regions were defined on a single chip using SA-CBE. Semiconductor optical amplifiers (SOAs) and transparent waveguides were fabricated in their appropriate regions. Extended cavity lasers, consisting of SOAs with passive waveguides on both sides, showed stable CW laser operation at a wavelength of 1.56 /spl mu/m. SA-CBE offers maximum design flexibility, since each device can be fabricated in its own optimized layer stack.
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