用90 μm硅衬底改进了塑料多带电感的q系数

H. M. Chang, H. Kao, S. Shih, Y. C. Lee, C. Ke, L. Chang, C. H. Wu, J. S. Fu, N. Karmakar
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引用次数: 0

摘要

本文提出了一种采用0.18 μm CMOS技术的多波段电感器,实现了高q因子和小尺寸的多波段应用。基于vlsi标准Si衬底的多波段电感器工作在超宽带范围内。工作频率在3ghz、4ghz、7.5 GHz和9ghz附近,q因子分别为6.5、6.7、8和11.5,电感分别为2.1、1.6、1.1、0.6 nH。将Si衬底薄化至90 μm,安装在塑料上后,由于减小了Si衬底的寄生效应,在不改变电感的情况下,q因子提高了25~31%。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Improvement the Q-factor of multi-band inductor with 90 μm silicon substrate on plastic
This paper presents the multi-band inductor with 0.18 μm CMOS technology on plastic achieves high Q-factor and small size for multiband applications. The multi-band inductor on VLSI-standard Si Substrate is operated at ultra-wide band range. The operation frequencies are near 3 GHz, 4 GHz, 7.5 GHz and 9 GHz of the Q-factor are 6.5, 6.7, 8 and 11.5 with the inductance 2.1, 1.6, 1.1, 0.6 nH, respectively. After thinning-down the Si substrate to 90 μm and mounting on plastic, the Q-factor can improve 25~31% without changing the inductance due to reducing the parasitic effect from Si-substrate.
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