H. M. Chang, H. Kao, S. Shih, Y. C. Lee, C. Ke, L. Chang, C. H. Wu, J. S. Fu, N. Karmakar
{"title":"用90 μm硅衬底改进了塑料多带电感的q系数","authors":"H. M. Chang, H. Kao, S. Shih, Y. C. Lee, C. Ke, L. Chang, C. H. Wu, J. S. Fu, N. Karmakar","doi":"10.1109/ISSSE.2010.5607110","DOIUrl":null,"url":null,"abstract":"This paper presents the multi-band inductor with 0.18 μm CMOS technology on plastic achieves high Q-factor and small size for multiband applications. The multi-band inductor on VLSI-standard Si Substrate is operated at ultra-wide band range. The operation frequencies are near 3 GHz, 4 GHz, 7.5 GHz and 9 GHz of the Q-factor are 6.5, 6.7, 8 and 11.5 with the inductance 2.1, 1.6, 1.1, 0.6 nH, respectively. After thinning-down the Si substrate to 90 μm and mounting on plastic, the Q-factor can improve 25~31% without changing the inductance due to reducing the parasitic effect from Si-substrate.","PeriodicalId":211786,"journal":{"name":"2010 International Symposium on Signals, Systems and Electronics","volume":"27 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2010-10-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Improvement the Q-factor of multi-band inductor with 90 μm silicon substrate on plastic\",\"authors\":\"H. M. Chang, H. Kao, S. Shih, Y. C. Lee, C. Ke, L. Chang, C. H. Wu, J. S. Fu, N. Karmakar\",\"doi\":\"10.1109/ISSSE.2010.5607110\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper presents the multi-band inductor with 0.18 μm CMOS technology on plastic achieves high Q-factor and small size for multiband applications. The multi-band inductor on VLSI-standard Si Substrate is operated at ultra-wide band range. The operation frequencies are near 3 GHz, 4 GHz, 7.5 GHz and 9 GHz of the Q-factor are 6.5, 6.7, 8 and 11.5 with the inductance 2.1, 1.6, 1.1, 0.6 nH, respectively. After thinning-down the Si substrate to 90 μm and mounting on plastic, the Q-factor can improve 25~31% without changing the inductance due to reducing the parasitic effect from Si-substrate.\",\"PeriodicalId\":211786,\"journal\":{\"name\":\"2010 International Symposium on Signals, Systems and Electronics\",\"volume\":\"27 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2010-10-21\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2010 International Symposium on Signals, Systems and Electronics\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ISSSE.2010.5607110\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2010 International Symposium on Signals, Systems and Electronics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISSSE.2010.5607110","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Improvement the Q-factor of multi-band inductor with 90 μm silicon substrate on plastic
This paper presents the multi-band inductor with 0.18 μm CMOS technology on plastic achieves high Q-factor and small size for multiband applications. The multi-band inductor on VLSI-standard Si Substrate is operated at ultra-wide band range. The operation frequencies are near 3 GHz, 4 GHz, 7.5 GHz and 9 GHz of the Q-factor are 6.5, 6.7, 8 and 11.5 with the inductance 2.1, 1.6, 1.1, 0.6 nH, respectively. After thinning-down the Si substrate to 90 μm and mounting on plastic, the Q-factor can improve 25~31% without changing the inductance due to reducing the parasitic effect from Si-substrate.