GaAs/AlxGa1−xAs核壳纳米线中少数载流子寿命的改善

N. Jiang, P. Parkinson, Q. Gao, J. Wong-Leung, S. Breuer, H. Tan, C. Jagadish
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引用次数: 0

摘要

采用金属有机气相沉积的方法,在au催化下制备了GaAs/AlxGa1-xAs核壳纳米线。透射电镜明光场图像显示,纳米线底部的变细主要是由GaAs帽生长引起的。在室温下进行了单纳米线的时间分辨光发光测量,在750℃下生长的AlxGa1-xAs壳层单纳米线的少数载流子寿命为(1.02±0.43)ns。壳生长温度与少数载流子寿命之间也有密切的关系。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Improvement of minority carrier lifetime in GaAs/AlxGa1−xAs core-shell nanowires
GaAs/AlxGa1-xAs core-shell nanowires were grown by metal organic chemical vapour deposition with Au-catalysed GaAs cores. Cross-section transmission electron microscope bright field images show that the tapering at bottom of the nanowires is mainly caused by GaAs cap growth. Time-resolved photo-luminescence measurements of single nanowires were taken at room temperature and a minority carrier lifetime of (1.02±0.43) ns was obtained for single nanowires with AlxGa1-xAs shell grown at 750°C. A close correlation between the shell growth temperature and minority carrier lifetime has also been observed.
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