M. Y. Li, J. P. Lee, C. H. Liu, J. C. Guo, S.S. Chung
{"title":"世界上第一个QLC RRAM:高可靠的电阻栅极闪存,具有创纪录的108耐久性和优异的保持力","authors":"M. Y. Li, J. P. Lee, C. H. Liu, J. C. Guo, S.S. Chung","doi":"10.1109/IRPS48203.2023.10117748","DOIUrl":null,"url":null,"abstract":"In this paper, we demonstrated successfully a quad-level cell (QLC) of a resistive-gate memory. It was implemented in a 1k bits chip with integration of FinFET core on a mature logic platform. Comprehensive reliabilities have been examined. The results show the forming-free property, low programming current $(< \\mu \\mathrm{A})$, high endurance and excellent data retention. A record high 5×108 endurance can be achieved. Furthermore, a 4-bit-per-cell (16 levels) has been demonstrated successfully. The chip-level performance is also analyzed, showing well disturbance-immune during SET/RESET, READ, which kept healthy signal-to-noise margin, 2-3x. This architecture is a strong candidate for the next generation resistance memory.","PeriodicalId":159030,"journal":{"name":"2023 IEEE International Reliability Physics Symposium (IRPS)","volume":"52 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2023-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"A World First QLC RRAM: Highly Reliable Resistive-Gate Flash with Record 108 Endurance and Excellent Retention\",\"authors\":\"M. Y. Li, J. P. Lee, C. H. Liu, J. C. Guo, S.S. Chung\",\"doi\":\"10.1109/IRPS48203.2023.10117748\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this paper, we demonstrated successfully a quad-level cell (QLC) of a resistive-gate memory. It was implemented in a 1k bits chip with integration of FinFET core on a mature logic platform. Comprehensive reliabilities have been examined. The results show the forming-free property, low programming current $(< \\\\mu \\\\mathrm{A})$, high endurance and excellent data retention. A record high 5×108 endurance can be achieved. Furthermore, a 4-bit-per-cell (16 levels) has been demonstrated successfully. The chip-level performance is also analyzed, showing well disturbance-immune during SET/RESET, READ, which kept healthy signal-to-noise margin, 2-3x. This architecture is a strong candidate for the next generation resistance memory.\",\"PeriodicalId\":159030,\"journal\":{\"name\":\"2023 IEEE International Reliability Physics Symposium (IRPS)\",\"volume\":\"52 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2023-03-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2023 IEEE International Reliability Physics Symposium (IRPS)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IRPS48203.2023.10117748\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2023 IEEE International Reliability Physics Symposium (IRPS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IRPS48203.2023.10117748","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
A World First QLC RRAM: Highly Reliable Resistive-Gate Flash with Record 108 Endurance and Excellent Retention
In this paper, we demonstrated successfully a quad-level cell (QLC) of a resistive-gate memory. It was implemented in a 1k bits chip with integration of FinFET core on a mature logic platform. Comprehensive reliabilities have been examined. The results show the forming-free property, low programming current $(< \mu \mathrm{A})$, high endurance and excellent data retention. A record high 5×108 endurance can be achieved. Furthermore, a 4-bit-per-cell (16 levels) has been demonstrated successfully. The chip-level performance is also analyzed, showing well disturbance-immune during SET/RESET, READ, which kept healthy signal-to-noise margin, 2-3x. This architecture is a strong candidate for the next generation resistance memory.