{"title":"一种中心箝位平行光束双稳MEMS机构","authors":"J. Qiu, Jeffrey H. Lang, Alexander H. Slocum","doi":"10.1109/MEMSYS.2001.906551","DOIUrl":null,"url":null,"abstract":"This paper presents a monolithic mechanically-bistable mechanism that does not rely on residual stress for its bistability. The bistable mechanism comprises two centrally-clamped parallel beams that have a curved shape but no residual stress after fabrication. Modal analysis and FEA simulation of the beams are used to predict and design the bistable behavior, and they agree well. Micro-scale mechanisms are fabricated by DRIE and their test results agree well with the theoretical and numerical predictions.","PeriodicalId":311365,"journal":{"name":"Technical Digest. MEMS 2001. 14th IEEE International Conference on Micro Electro Mechanical Systems (Cat. No.01CH37090)","volume":"8 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2001-01-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"100","resultStr":"{\"title\":\"A centrally-clamped parallel-beam bistable MEMS mechanism\",\"authors\":\"J. Qiu, Jeffrey H. Lang, Alexander H. Slocum\",\"doi\":\"10.1109/MEMSYS.2001.906551\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper presents a monolithic mechanically-bistable mechanism that does not rely on residual stress for its bistability. The bistable mechanism comprises two centrally-clamped parallel beams that have a curved shape but no residual stress after fabrication. Modal analysis and FEA simulation of the beams are used to predict and design the bistable behavior, and they agree well. Micro-scale mechanisms are fabricated by DRIE and their test results agree well with the theoretical and numerical predictions.\",\"PeriodicalId\":311365,\"journal\":{\"name\":\"Technical Digest. MEMS 2001. 14th IEEE International Conference on Micro Electro Mechanical Systems (Cat. No.01CH37090)\",\"volume\":\"8 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2001-01-21\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"100\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Technical Digest. MEMS 2001. 14th IEEE International Conference on Micro Electro Mechanical Systems (Cat. No.01CH37090)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/MEMSYS.2001.906551\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Technical Digest. MEMS 2001. 14th IEEE International Conference on Micro Electro Mechanical Systems (Cat. No.01CH37090)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/MEMSYS.2001.906551","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
A centrally-clamped parallel-beam bistable MEMS mechanism
This paper presents a monolithic mechanically-bistable mechanism that does not rely on residual stress for its bistability. The bistable mechanism comprises two centrally-clamped parallel beams that have a curved shape but no residual stress after fabrication. Modal analysis and FEA simulation of the beams are used to predict and design the bistable behavior, and they agree well. Micro-scale mechanisms are fabricated by DRIE and their test results agree well with the theoretical and numerical predictions.