GaAs种子制备大块InGaAs晶体生长的应变问题

M.R. Islam, M.S. Rahman, P. Verma, M. Yamada
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引用次数: 0

摘要

利用拉曼散射和能量色散x射线实验研究了由GaAs种子生长的大块InxGa1-xAs晶体的应变问题。采用流动液相区法(TLZ)和多组分区熔法(MCZM)生长的大块InxGa1-xAs晶体中存在大量的残余应变。利用轴对称应变模型,对各种可能的成分剖面进行了应变分布评估,包括目前在MCZM方法中使用的剖面。研究发现,通过改变目前使用的生长方法的轮廓,可以显著降低残余应变。采用MCZM法制备的In0.3Ga0.7As种子晶体,按照本研究提出的思路,可望通过TLZ法获得高质量的大块In0.3Ga0.7As晶体。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Strain Issues on Crystal Growth of Bulk InGaAs from GaAs Seed
Strain issues in bulk InxGa1-xAs crystals grown from GaAs seed have been investigated using Raman scattering and energy dispersive X-ray experiments. It has been found that there exists a large amount of residual strain in bulk InxGa1-xAs crystals grown by the traveling liquidus zone (TLZ) and multi-component zone melting (MCZM) methods. Using axially symmetrical strain model, strain distributions have been evaluated for various possible compositional profiles including the profile currently used in the MCZM method. It has been found that the residual strain can be reduced remarkably by changing the profile presently being used in this growth method. It is expected that high-quality bulk In0.3Ga0.7As crystal can be obtained by the TLZ method using In0.3Ga0.7As seed-crystal which may be prepared by the MCZM method following the profile suggested in the present study.
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