窄隙PbTe中In、Ga、Ge的电荷杂质态

V. Zlomanov, A. K. Tkalich
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引用次数: 5

摘要

采用XPS/XAES技术分析了掺杂在费米能级稳定点以上的PbTe单晶中In、Ga、Ge杂质的主导电子态。结果表明,在PbTe中,In杂质原子的有效电子态可以表示为5s25p1和5s05p3构型的混合物,而Ga杂质原子则以4s04p3给体构型存在。锗原子的氧化态大于2+。用x射线扩散散射法在Pb1-xInxTe中发现了空位团簇和间隙团簇。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Charge impurity states of In, Ga, Ge in narrow-gap PbTe
The XPS/XAES technique is applied to analyze the dominant electronic state of In, Ga, Ge impurities in PbTe single crystals doped above the point of Fermi level stabilization. It is shown that the effective electronic state of In impurity in PbTe can be represented as a mixture of 5s25p1 and 5s05p3 configurations, while Ga impurity atoms are present in the donor configuration 4s04p3. Oxidation state of Ge-atom is more than 2+. Vacancionic and interstitial clusters were revealed in Pb1-xInxTe by x-ray diffusive scattering method.
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