硅中间体和基于tsv的3D集成电路中ir降噪声的细粒度联合模拟方法

Taigon Song, S. Lim
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引用次数: 7

摘要

在本文中,我们提出了一种可以同时模拟三维集成电路、硅中间层和PCB的ir下降噪声的方法,并证明了硅中间层中的ir下降有多严重。该方法不仅使用PCB和封装(硅中间层)堆叠信息,还使用全晶体管级3D IC开关信息进行精确的ir降计算。利用这些信息,我们展示了中间层中PDN(配电网络)和安装在其上的3D IC的IR-drop噪声图。根据我们的研究结果,我们发现:(1)硅中间体引起的IR-drop噪声非常严重,可以达到几十mV;(2)我们的联合分析方法修复了传统方法对IR-drop的过高估计。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A fine-grained co-simulation methodology for IR-drop noise in silicon interposer and TSV-based 3D IC
In this paper, we propose a methodology which can co-simulate IR-drop noise for 3D IC, silicon interposer, and PCB simultaneously, and demonstrate how severe the IR-drop is in the silicon interposer. This methodology uses not only PCB and package (silicon interposer) stacking information, but also full transistor-level 3D IC switching information for a precise IR-drop calculation. By utilizing these information, we show the IR-drop noise map of the PDN (Power Distribution Network) in the interposer and the 3D IC mounted on it. Based on our results, we found that (1) the IR-drop noise caused by silicon interposer is very severe to few tens of mV, and (2) our co-analysis method fixes the overestimation of IR-drop caused by the traditional method.
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