激光脉冲校正靠近氧化防御掩膜边界的二维Pearson-IV离子注入杂质谱线,用于创建矩阵CdHgTe红外探测器

L. Monastyrskii, Yu. Sokyrka, O. Ivanel, I. Olenych, R. Kovtun
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引用次数: 0

摘要

提出了一种新的物理模型,并给出了数值计算结果。根据该模型,在脉冲激光的影响下,离子注入杂质的二维浓度分布具有初始分布的Pearson-IV型。该模型的排他性不仅与浓度梯度的配准作用有关,还与CdHgTe晶体内部的热扩散应力、热电场以及考虑热导率和材料密度的温度依赖关系的演化温度-坐标场依赖关系的并行计算有关。采用数值隐式方法求解一组非线性非平稳微分方程,研究了离子注入CdHgTe杂质近边缘的侧扩散过程。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Laser pulse correcting 2D Pearson-IV ion-implanted impurity profiles near the oxidal defense mask boundary for creating matrix CdHgTe infrared detector
We proposed a new physical model and results of numerical calculations. According to this model, 2D concentrations of ion-implanted impurity profiles with initial distribution Pearson-IV's type under pulse laser influence. Exclusive character of this model was connected with registration action not only concentration gradient but also internal thermodiffusional stress, thermoelectric fields and parallel calculation of evolution temperature-coordinate field dependence in CdHgTe crystal with taking to account temperature dependencies of thermoconductivity and density of material. Using numerical implicit method for solving set of nonlinear nonstationary differential equations we investigated processes of side diffusion of ion-implanted in CdHgTe impurity near edge of defense mask.
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