石墨薄膜厚度对石墨/n-Si肖特基异质结电学和光电性能的影响

S. Kuryshchuk, A. Mostovyi, I. Koziarskyi, M. Solovan
{"title":"石墨薄膜厚度对石墨/n-Si肖特基异质结电学和光电性能的影响","authors":"S. Kuryshchuk, A. Mostovyi, I. Koziarskyi, M. Solovan","doi":"10.18524/1815-7459.2022.3.265294","DOIUrl":null,"url":null,"abstract":"Graphite /n-Si Schottky diodes were fabricated by  electron beam evaporation of graphite thin films on  n-type silicon substrates. The influence of the  thickness of graphite films on the photoelectric and electrical properties of these diodes has been  studied. It is determined that our Schottky diodes  can be used as photodiodes and solar cells. The  temperature dependences of shunt and series  resistances of diodes were also investigated.\nIn the case of forward and reverse bias, the dominant  mechanisms of current transfer through the studied diodes were determined. The responsivity and detectivity of graphite/n-Si Schottky diodes were also calculated.\nThe studied heterojunctions have  pronounced diode characteristics with a rectification  coefficient for a structure with a thinner film RR ≈  5·102, and for a structure with a thicker film RR ≈ 102.","PeriodicalId":367487,"journal":{"name":"Sensor Electronics and Microsystem Technologies","volume":"51 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2022-10-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"INFLUENCE OF GRAPHITE FILM THICKNESS ON ELECTRICAL AND PHOTOELECTRIC PROPERTIES OF GRAPHITE/n-Si SCHOTTKY-TYPE HETEROJUNCTION\",\"authors\":\"S. Kuryshchuk, A. Mostovyi, I. Koziarskyi, M. Solovan\",\"doi\":\"10.18524/1815-7459.2022.3.265294\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Graphite /n-Si Schottky diodes were fabricated by  electron beam evaporation of graphite thin films on  n-type silicon substrates. The influence of the  thickness of graphite films on the photoelectric and electrical properties of these diodes has been  studied. It is determined that our Schottky diodes  can be used as photodiodes and solar cells. The  temperature dependences of shunt and series  resistances of diodes were also investigated.\\nIn the case of forward and reverse bias, the dominant  mechanisms of current transfer through the studied diodes were determined. The responsivity and detectivity of graphite/n-Si Schottky diodes were also calculated.\\nThe studied heterojunctions have  pronounced diode characteristics with a rectification  coefficient for a structure with a thinner film RR ≈  5·102, and for a structure with a thicker film RR ≈ 102.\",\"PeriodicalId\":367487,\"journal\":{\"name\":\"Sensor Electronics and Microsystem Technologies\",\"volume\":\"51 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2022-10-18\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Sensor Electronics and Microsystem Technologies\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.18524/1815-7459.2022.3.265294\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Sensor Electronics and Microsystem Technologies","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.18524/1815-7459.2022.3.265294","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

采用电子束蒸发法在n型硅衬底上制备了石墨/n-Si肖特基二极管。研究了石墨膜厚度对二极管光电性能和电学性能的影响。确定了我们的肖特基二极管可以用作光电二极管和太阳能电池。还研究了二极管并联电阻和串联电阻的温度依赖性。在正向偏置和反向偏置的情况下,确定了通过所研究的二极管的电流转移的主要机制。计算了石墨/n-Si肖特基二极管的响应率和探测率。所研究的异质结具有明显的二极管特性,薄膜较薄的结构的整流系数RR≈5·102,薄膜较厚的结构的整流系数RR≈102。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
INFLUENCE OF GRAPHITE FILM THICKNESS ON ELECTRICAL AND PHOTOELECTRIC PROPERTIES OF GRAPHITE/n-Si SCHOTTKY-TYPE HETEROJUNCTION
Graphite /n-Si Schottky diodes were fabricated by  electron beam evaporation of graphite thin films on  n-type silicon substrates. The influence of the  thickness of graphite films on the photoelectric and electrical properties of these diodes has been  studied. It is determined that our Schottky diodes  can be used as photodiodes and solar cells. The  temperature dependences of shunt and series  resistances of diodes were also investigated. In the case of forward and reverse bias, the dominant  mechanisms of current transfer through the studied diodes were determined. The responsivity and detectivity of graphite/n-Si Schottky diodes were also calculated. The studied heterojunctions have  pronounced diode characteristics with a rectification  coefficient for a structure with a thinner film RR ≈  5·102, and for a structure with a thicker film RR ≈ 102.
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