用于低压液化气体的稳定流量气体输送系统

Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing (IEEE Cat. No.00CH37130) Pub Date : 2000-09-26 DOI:10.1109/ISSM.2000.993694

H. Takagi, M. Ino, M. Tabata, Y. Nishikawa

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引用次数: 0

摘要

本文介绍了全气相供气系统在稳定压力和相对高流量下供应低蒸气压液化气的可能性，以及使用WF/sub - 6/和BCl/sub - 3/的评价试验结果。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Stable flow gas delivery system for low pressure liquefied gases

This paper describes the possibility to supply the low vapor pressure liquefied gas at stable pressure and relatively high flow rate by a system called all vapor phase gas delivery system, together with evaluation test results using WF/sub 6/ and BCl/sub 3/.

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Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing (IEEE Cat. No.00CH37130)

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