InGaP/GaAs融合HBT-FET (BiFET)技术及其在手机功率放大器设计中的应用

A. Metzger, P. Zampardi, M. Sun, J. Li, C. Cismaru, L. Rushing, R. Ramanathan
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引用次数: 6

摘要

在过去的十年中,GaAs hbt已经成为无线手机功率放大器的主导技术。现代应用需求和尺寸限制已经推动行业领导者走向耗尽型n-FET和GaAs HBT的协集成。双极和场效应管(BiFET)的合并,为设计独立于硅控制器的先进功率放大器提供了额外的自由度。本文概述了可用于合并两种器件技术的各种技术,然后展示了如何在HBT的发射极层中形成FET的合并外延结构,将功能多功能性与低成本供应数百万功率放大器所需的大批量制造性相结合。具体的手机应用可以受益或启用BiFET,如自动偏置功率放大器,先进的偏置控制与低或无基准电压,片上功率检测器,集成运算放大器。当纯npn偏置电路限制在低电压参考电平时,具有BiFET偏置级的HBT功率放大器比纯npn功率放大器具有更好的射频性能
本文章由计算机程序翻译,如有差异,请以英文原文为准。
An InGaP/GaAs Merged HBT-FET (BiFET) Technology and Applications to the Design of Handset Power Amplifiers
The last decade has seen GaAs HBTs emerge as the dominant technology in wireless handset power amplifiers. Modern application requirements and size limitations have driven industry leaders towards the co-integration of depletion mode n-FET and GaAs HBT. The merger of bipolar and FET, or BiFET, gives an additional degree of freedom in the design of advanced power amplifiers independent of a silicon controller. This paper provides an overview of the various techniques that can be used to merge the two device technologies and then show how a merged epitaxial structure, where a FET is formed in the emitter layers of an HBT, combines functional versatility with the high volume manufacturability needed to supply millions of power amplifiers at low cost. Specific handset applications that can benefit or be enabled by BiFET are presented, such as auto-bias power amplifiers, advanced bias control with low or no voltage reference, on-chip power detectors, and integrated operational amplifiers. When npn-only bias circuitry is limited to low voltage reference levels, HBT power amplifiers with BiFET bias stages are shown to have superior RF performance to their npn-only counterparts
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