光敏硅氧烷的研制

Lithography Asia Pub Date : 2008-11-20 DOI:10.1117/12.804669

Y. Tashiro, Takeshi Sekito, T. Iwata, Daishi Yokoyama, T. Nonaka

{"title":"光敏硅氧烷的研制","authors":"Y. Tashiro, Takeshi Sekito, T. Iwata, Daishi Yokoyama, T. Nonaka","doi":"10.1117/12.804669","DOIUrl":null,"url":null,"abstract":"We succeeded in development of SOG materials comprised of cage-type phenyl silsesquioxanes (PSQ) and their alkali soluble derivatives. The alkali soluble silsesquioxane (APSQ) can provide both positive and negative tone photosensitive SOG combination with diazo naphtoquinone (DNQ) and photo-base (acid) agent, respectively. Here we present feature of photolithography process and film properties for our SOG materials.","PeriodicalId":383504,"journal":{"name":"Lithography Asia","volume":"20 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2008-11-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":"{\"title\":\"Development of photosensitive silsesquioxane\",\"authors\":\"Y. Tashiro, Takeshi Sekito, T. Iwata, Daishi Yokoyama, T. Nonaka\",\"doi\":\"10.1117/12.804669\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We succeeded in development of SOG materials comprised of cage-type phenyl silsesquioxanes (PSQ) and their alkali soluble derivatives. The alkali soluble silsesquioxane (APSQ) can provide both positive and negative tone photosensitive SOG combination with diazo naphtoquinone (DNQ) and photo-base (acid) agent, respectively. Here we present feature of photolithography process and film properties for our SOG materials.\",\"PeriodicalId\":383504,\"journal\":{\"name\":\"Lithography Asia\",\"volume\":\"20 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2008-11-20\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"3\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Lithography Asia\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1117/12.804669\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Lithography Asia","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.804669","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 3

摘要

我们成功地开发了由笼型苯基硅氧烷(PSQ)及其碱溶衍生物组成的SOG材料。碱溶硅氧烷(APSQ)可分别与重氮萘醌(DNQ)和光碱(酸)剂组合提供正、负色调光敏SOG。本文介绍了SOG材料的光刻工艺特点和薄膜性能。

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Development of photosensitive silsesquioxane

We succeeded in development of SOG materials comprised of cage-type phenyl silsesquioxanes (PSQ) and their alkali soluble derivatives. The alkali soluble silsesquioxane (APSQ) can provide both positive and negative tone photosensitive SOG combination with diazo naphtoquinone (DNQ) and photo-base (acid) agent, respectively. Here we present feature of photolithography process and film properties for our SOG materials.

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Lithography Asia

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