用Peltier冷却实验测量了快速熔化生长SiGe导线的热电特性

S. Hashimoto, Kouta Takahashi, S. Oba, T. Terada, Masataka Ogasawara, M. Tomita, M. Kurosawa, Takanobu Watanabe
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引用次数: 0

摘要

利用快速熔化生长法(RMG)制备的SiGe金属丝进行了珀尔帖冷却实验。根据Peltier加热/冷却速率估算的SiGe丝的导热系数κ与RMG工艺有显著的相关性;从Si种子岛向一个方向生长的κ比双向生长的κ小。根据分子动力学模拟,κ几乎不依赖于成分分布,表明RMG过程差异的影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Thermoelectric Characteristics of Rapid-Melting-Grown SiGe Wires Measured by Peltier Cooling Experiment
We performed a Peltier cooling experiment using SiGe wires fabricated by rapid-melting-growth (RMG) method. Thermal conductivity κ of SiGe wires estimated from the Peltier heating/cooling rate showed a significant dependence on the RMG process; the growth into one direction from a Si seed island exhibit a smaller κ than the bilateral growth. According to molecular dynamics simulation, the κ hardly depend on the compositional distribution, indicating the impact of the difference in the RMG processes.
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