一种新型柱栅MOSFET结构漏极电流和跨导分析研究

Hind Jaafar, A. Aouaj, A. Bouziane, B. Iñíguez
{"title":"一种新型柱栅MOSFET结构漏极电流和跨导分析研究","authors":"Hind Jaafar, A. Aouaj, A. Bouziane, B. Iñíguez","doi":"10.1109/ICOA.2018.8370495","DOIUrl":null,"url":null,"abstract":"In this paper, we present a comparison study on the performance of cylindrical gate (CG) MOSFET with graded channel doping (GC), dual metal gate (DMG) and dual oxide thickness (DOT). We develop compact model of short channel characteristics like drain current density, transconductance and drain conductance for this new structure (GC-DMG-DOT) SG MOSFET by solving 2D Poisson equation. The results are compared with the DMG MOSFET and DMG-DOT MOSFET devices. The model results are validated by numerical simulation results obtained by commercially simulator TCAD ATLAS.","PeriodicalId":433166,"journal":{"name":"2018 4th International Conference on Optimization and Applications (ICOA)","volume":"21 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2018-04-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":"{\"title\":\"Analytical study of drain current and transconductance for a new cylindrical gate MOSFET structure\",\"authors\":\"Hind Jaafar, A. Aouaj, A. Bouziane, B. Iñíguez\",\"doi\":\"10.1109/ICOA.2018.8370495\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this paper, we present a comparison study on the performance of cylindrical gate (CG) MOSFET with graded channel doping (GC), dual metal gate (DMG) and dual oxide thickness (DOT). We develop compact model of short channel characteristics like drain current density, transconductance and drain conductance for this new structure (GC-DMG-DOT) SG MOSFET by solving 2D Poisson equation. The results are compared with the DMG MOSFET and DMG-DOT MOSFET devices. The model results are validated by numerical simulation results obtained by commercially simulator TCAD ATLAS.\",\"PeriodicalId\":433166,\"journal\":{\"name\":\"2018 4th International Conference on Optimization and Applications (ICOA)\",\"volume\":\"21 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2018-04-26\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"4\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2018 4th International Conference on Optimization and Applications (ICOA)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICOA.2018.8370495\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2018 4th International Conference on Optimization and Applications (ICOA)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICOA.2018.8370495","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 4

摘要

本文对梯度通道掺杂(GC)、双金属栅(DMG)和双氧化物厚度(DOT)的圆柱栅MOSFET的性能进行了比较研究。通过求解二维泊松方程,建立了这种新型结构(GC-DMG-DOT) SG MOSFET漏极电流密度、跨导和漏极电导等短沟道特性的紧凑模型。结果与DMG MOSFET和DMG- dot MOSFET器件进行了比较。通过商用仿真器TCAD ATLAS的数值模拟结果验证了模型的正确性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Analytical study of drain current and transconductance for a new cylindrical gate MOSFET structure
In this paper, we present a comparison study on the performance of cylindrical gate (CG) MOSFET with graded channel doping (GC), dual metal gate (DMG) and dual oxide thickness (DOT). We develop compact model of short channel characteristics like drain current density, transconductance and drain conductance for this new structure (GC-DMG-DOT) SG MOSFET by solving 2D Poisson equation. The results are compared with the DMG MOSFET and DMG-DOT MOSFET devices. The model results are validated by numerical simulation results obtained by commercially simulator TCAD ATLAS.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信