抑制短通道效应的非对称无结DMDG MOSFET解析建模

A. Basak, A. Sarkar
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引用次数: 0

摘要

本文提出了采用高K介电材料的非对称无结双材料双栅(AJDMDG) mosfet结构的静电势、电场、前门阈值电压(Vth)、亚阈值摆幅(SS)的解析模型。通过抛物线近似法求解泊松方程,求出静电势。此外,通过改变后门氧化层厚度和电压,建立了器件性能不对称的解析模型。将解析解的实际结果与TCAD仿真结果进行了比较,验证了器件结构。对AJDMDG和无结DMDG (JDMDG) MOSFET结构进行了比较研究,以显示非对称操作对抑制短通道效应(ses)的器件性能的影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Analytical Modeling of Asymmetric Junctionless DMDG MOSFET for Suppressing Short Channel Effects
In this paper, an analytical model is proposed for Asymmetric Junctionless dual material double gate (AJDMDG) MOSFETs structure with high K dielectric material for developing electrostatic potential, electric field, front gate threshold voltage (Vth), subthreshold swing (SS). The electrostatic potential is found by solving Poisson’s equation through parabolic approximation method. Moreover, the analytical model is developed for asymmetric nature in device performance through altering back gate oxide thicknesses and voltage. The substantial outcomes of analytical solution are compared with the result of TCAD simulation to validate the device structure. A comparative study has been carried for AJDMDG and junctionless DMDG (JDMDG) MOSFET structure to show the efficacy of asymmetric operation in device performance for suppressing short channel effects (SCEs).
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