MNiSn (M=Zr, Hf)的高温热电性能

B. Cook, G. Meisner, J. Yang, C. Uher
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引用次数: 10

摘要

本文研究了一系列M=Zr, Hf的MNiSn型金属间半heusler合金的高温输运特性。由于在态密度中形成伪间隙,这些材料的半导体性质使它们成为中温热电应用的有希望的候选者。采用电弧熔炼法制备了纯ZrNiSn和掺sb的ZrNiSn、HfNiSn和(Zr-Hf)NiSn样品,并进行了热处理均匀化。用x射线衍射测定相纯度,用扫描电镜观察显微组织。这些样品的电阻率和塞贝克系数的温度依赖性在300 ~ 1050 K之间。在室温下,数据与我们最近报道的结果非常吻合。热功率最初随着温度的升高而增加,在400k和600k之间有一个宽的最大值,然后减小到一个共同的值,这是禁隙大小的特征。电阻率随温度降低,遵循T/sup -1/关系。热功率的大小与Hf/Zr比之间存在相关性。从1n(/spl sigma/)与倒数温度的关系图中估计了间隙的大小,给出了0.21 eV的值,这与先前的估计很好地一致。讨论了锑和铋掺杂对电性能的影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
High temperature thermoelectric properties of MNiSn (M=Zr, Hf)
The high temperature transport properties in a series of intermetallic half-Heusler alloys of the form MNiSn, where M=Zr, Hf, have been examined. The semiconducting nature of these materials due to the formation of a pseudo-gap in the density of states make them promising candidates for intermediate temperature thermoelectric applications. Samples of pure and Sb-doped ZrNiSn, HfNiSn, and (Zr-Hf)NiSn were prepared by arc melting and homogenized by heat treatment. Phase purity was determined by X-ray diffraction and the microstructures were examined by scanning electron microscopy. The temperature dependence of the electrical resistivity and Seebeck coefficient of these samples was characterized between 300 K and 1050 K. At room temperature, the data match closely with the results recently reported by us. The thermopower initially increases with temperature, exhibits a broad maximum between 400 K and 600 K, and decreases to a common value, characteristic of the magnitude of the forbidden gap. The electrical resistivity decreases with temperature following a T/sup -1/ dependence. A correlation between the magnitude of the thermopower and the Hf/Zr ratio was observed. An estimate of the magnitude of the gap was made from a plot of 1n(/spl sigma/) versus reciprocal temperature, giving a value of 0.21 eV which is in good agreement with previous estimates. The effects of antimony and bismuth doping on the electrical properties are discussed.
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