用于光波通信的DH - Ga1-XAlX led的可靠性

C. Zipfel, A. Chin, V. Keramidas, R. H. Saul
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引用次数: 4

摘要

双异质结构Gal-xAlXAs led在高电流密度(3 × 103 A/cm2)下工作,被用作光波通信系统的光源,例如光学数据链路。本文讨论了这些器件的可靠性,区分了由于暗线缺陷(DLD)形成的灾难性退化和逐渐老化机制。观察到DLD形成的两种模式:(1)在螺纹位错形成DLD时,一定比例的器件在相对较短的时间内失效。这些dld的生长强烈依赖于电流,但与温度无关。100小时,100毫安的老化消除了所有在这种模式下失效的设备。老化失败率可以保持在5%以下。(2)在加速老化条件下,采用新的DLD形成方式,103h后通过老化的器件失效率高达25%。这种模式与温度有关,并与介电-金属界面处的应力有关。分析表明,25%的畸形人群在70°C时给出了¿40 FITS。透明器件的加速老化研究由于两个相互竞争的过程而变得复杂:光输出的缓慢退化和在高温下占主导地位的缓慢增加。两个过程的活化能分别为0.65和0.75 eV。MTTF的预估值在25°C时为9 × 107h,在70°C时为4 × 106h。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Reliability of DH Ga1-XAlX As LEDs For Lightwave Communications
Double heterostructure Gal-xAlXAs LEDs operated at high current densities (3 × 103 A/cm2) are being used as sources in lightwave communication systems, for example in optical data links. This paper discusses the reliability of these devices, distinguishing between catastrophic degradation due to Dark Line Defect (DLD) formation and gradual aging mechanisms. Two modes of DLD formation are observed: (1) A certain percentage of devices fail in relatively short times by DLD formation at threading dislocations. The growth of these DLDs is strongly current dependent, but independent of temperature. A 100h, 100 mA burn-in eliminates all of the devices which fail by this mode. Burn-in failures can be kept as low as 5%. (2) Under accelerated aging as many as 25% of the devices which passed the burn-in fail after 103h by a new mode of DLD formation. This mode is temperature dependent and related to stress at the dielectric-metal interface. Analysis shows that a 25% freak population gives ¿40 FITS at 70°C. Accelerated aging studies of clear devices are complicated by two competing processes: a slow degradation in light output and a slow increase which dominates at high temperatures. Activation energies for the two processes are 0.65 and 0.75 eV, respectively. Projected values of MTTF are 9 × 107h at 25°C and 4 × 106h at 70°C.
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