阳离子表面活性剂对高纵横比光刻胶制版中减少图案塌陷的影响

2005 International Conference on MEMS,NANO and Smart Systems Pub Date : 2005-07-24 DOI:10.1109/ICMENS.2005.93

K. Grundke, A. Drechsler, N. Petong, C. Bellmann, M. Stamm, O. Wunnicke, J. Reichelt, Iris Mäge, B. Pinter, T. Pearce, M. Voigt

{"title":"阳离子表面活性剂对高纵横比光刻胶制版中减少图案塌陷的影响","authors":"K. Grundke, A. Drechsler, N. Petong, C. Bellmann, M. Stamm, O. Wunnicke, J. Reichelt, Iris Mäge, B. Pinter, T. Pearce, M. Voigt","doi":"10.1109/ICMENS.2005.93","DOIUrl":null,"url":null,"abstract":"This paper presents a novel concept based on the mechanism of cationic surfactant adsorption on the photoresist surface. The minimum capillary forces calculated from the study with model photoresist surfaces and surfactant solutions correlated with a maximum of pattern collapse reduction obtained in the photolithographic process.","PeriodicalId":185824,"journal":{"name":"2005 International Conference on MEMS,NANO and Smart Systems","volume":"93 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2005-07-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"On the effect of cationic surfactants in the rinse to reduce pattern collapse in high aspect ratio patterning of photoresists\",\"authors\":\"K. Grundke, A. Drechsler, N. Petong, C. Bellmann, M. Stamm, O. Wunnicke, J. Reichelt, Iris Mäge, B. Pinter, T. Pearce, M. Voigt\",\"doi\":\"10.1109/ICMENS.2005.93\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper presents a novel concept based on the mechanism of cationic surfactant adsorption on the photoresist surface. The minimum capillary forces calculated from the study with model photoresist surfaces and surfactant solutions correlated with a maximum of pattern collapse reduction obtained in the photolithographic process.\",\"PeriodicalId\":185824,\"journal\":{\"name\":\"2005 International Conference on MEMS,NANO and Smart Systems\",\"volume\":\"93 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2005-07-24\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2005 International Conference on MEMS,NANO and Smart Systems\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICMENS.2005.93\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2005 International Conference on MEMS,NANO and Smart Systems","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICMENS.2005.93","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 0

摘要

本文基于阳离子表面活性剂在光刻胶表面的吸附机理，提出了一个新的概念。用模型光刻胶表面和表面活性剂溶液计算的最小毛细力与光刻过程中获得的最大图案崩溃减少相关。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

查看原文本刊更多论文

On the effect of cationic surfactants in the rinse to reduce pattern collapse in high aspect ratio patterning of photoresists

This paper presents a novel concept based on the mechanism of cationic surfactant adsorption on the photoresist surface. The minimum capillary forces calculated from the study with model photoresist surfaces and surfactant solutions correlated with a maximum of pattern collapse reduction obtained in the photolithographic process.

求助全文

通过发布文献求助，成功后即可免费获取论文全文。去求助

来源期刊

2005 International Conference on MEMS,NANO and Smart Systems

自引率

0.00%

发文量