基于样条中心和自适应样本范围回归的失配感知模拟性能宏建模

Shubhankar Basu, Balaji Kommineni, R. Vemuri
{"title":"基于样条中心和自适应样本范围回归的失配感知模拟性能宏建模","authors":"Shubhankar Basu, Balaji Kommineni, R. Vemuri","doi":"10.1109/VLSI.2008.76","DOIUrl":null,"url":null,"abstract":"Analog design traditionally relies on designer's knowldge and expertise. Numerous automated synthesis methods have been proposed over the years; they reduce time complexity and explore wider design space. Manufacturing induced defects in the process parameters, render device characteristics inconsistent with their prediced behavior. Device mismatch causes significant variation in analog circuit performance. Monte Carlo simulation is known to be the most accurate method of measuring performance under random variation. But monte-carlo simulation is prohivitively expensive during synthesis process. In this work we present a novel Spline Center and Range Regression (SCRR) technique on adaptive samples to model performance in the presence of process variation. Mismatch aware macromodels can provide considerable speedup during synthesis with minimal loss in accuracy. Experimental results demonstrate the accuracy of the macromodels on an independent validation set using 180nm and 65nm technologies.","PeriodicalId":143886,"journal":{"name":"21st International Conference on VLSI Design (VLSID 2008)","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2008-01-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Mismatch Aware Analog Performance Macromodeling Using Spline Center and Range Regression on Adaptive Samples\",\"authors\":\"Shubhankar Basu, Balaji Kommineni, R. Vemuri\",\"doi\":\"10.1109/VLSI.2008.76\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Analog design traditionally relies on designer's knowldge and expertise. Numerous automated synthesis methods have been proposed over the years; they reduce time complexity and explore wider design space. Manufacturing induced defects in the process parameters, render device characteristics inconsistent with their prediced behavior. Device mismatch causes significant variation in analog circuit performance. Monte Carlo simulation is known to be the most accurate method of measuring performance under random variation. But monte-carlo simulation is prohivitively expensive during synthesis process. In this work we present a novel Spline Center and Range Regression (SCRR) technique on adaptive samples to model performance in the presence of process variation. Mismatch aware macromodels can provide considerable speedup during synthesis with minimal loss in accuracy. Experimental results demonstrate the accuracy of the macromodels on an independent validation set using 180nm and 65nm technologies.\",\"PeriodicalId\":143886,\"journal\":{\"name\":\"21st International Conference on VLSI Design (VLSID 2008)\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2008-01-04\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"21st International Conference on VLSI Design (VLSID 2008)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/VLSI.2008.76\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"21st International Conference on VLSI Design (VLSID 2008)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/VLSI.2008.76","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

摘要

模拟设计传统上依赖于设计师的知识和专业知识。多年来,已经提出了许多自动合成方法;它们减少了时间复杂度,探索了更广阔的设计空间。制造过程中引起的工艺参数缺陷,使器件特性与其预期行为不一致。器件失配导致模拟电路性能的显著变化。蒙特卡罗模拟被认为是测量随机变化下性能的最精确的方法。但在合成过程中蒙特卡罗模拟的成本过高。在这项工作中,我们提出了一种新的样条中心和范围回归(SCRR)技术,用于自适应样本来模拟存在过程变化的性能。对失配敏感的宏模型可以在合成过程中以最小的精度损失提供相当大的加速。实验结果表明,采用180nm和65nm技术的宏模型在独立验证集上具有较高的准确性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Mismatch Aware Analog Performance Macromodeling Using Spline Center and Range Regression on Adaptive Samples
Analog design traditionally relies on designer's knowldge and expertise. Numerous automated synthesis methods have been proposed over the years; they reduce time complexity and explore wider design space. Manufacturing induced defects in the process parameters, render device characteristics inconsistent with their prediced behavior. Device mismatch causes significant variation in analog circuit performance. Monte Carlo simulation is known to be the most accurate method of measuring performance under random variation. But monte-carlo simulation is prohivitively expensive during synthesis process. In this work we present a novel Spline Center and Range Regression (SCRR) technique on adaptive samples to model performance in the presence of process variation. Mismatch aware macromodels can provide considerable speedup during synthesis with minimal loss in accuracy. Experimental results demonstrate the accuracy of the macromodels on an independent validation set using 180nm and 65nm technologies.
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