全集成SPAD主动淬火/复位电路在高压0.35 μ m CMOS达到PDP饱和在650纳米

Alija Dervić, S. K. Poushi, H. Zimmermann
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引用次数: 1

摘要

本文提出了一种完全集成的光学传感器IC,具有SPAD、淬火/复位电路和基于0.35 μm高压CMOS技术优化的可调阈值逆变器的新型传感级。该淬灭器具有可控的偏置电压和可调的总死区时间。多余偏置电压范围为10v ~ 22v。死区时间范围为8ns ~ 50ns,对应的饱和计数速率范围为20mcps ~ 125mcps。该淬灭器针对SPAD进行了优化,采用高压CMOS技术,电容为150ff。使用我们最近发表的光子检测概率(PDP)模型,并将其拟合到我们之前的条带测量结果中,在9.9 V过量偏置下的PDP高达68.8%,估计VEX=17.9 V时650 nm处的峰值PDP为90.1%(饱和PDP),在850 nm处的PDP超过50%达到相同的过量偏置电压。据作者所知,集成SPAD的PDP饱和度从未达到过。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Fully-integrated SPAD active quenching/resetting circuit in high-voltage 0.35-μ m CMOS for reaching PDP saturation at 650 nm
This paper presents a fully-integrated optical sensor IC with SPAD, quenching/resetting circuit, and novel sensing stage based on a tunable-threshold inverter optimized for 0.35-μm high-voltage CMOS technology. The presented quencher features a controllable excess bias voltage and an adjustable total dead time. The excess bias voltage ranges from 10 V to a maximum of 22 V. The dead time ranges from 8 ns to 50 ns, which corresponds to a saturation count rate range from 20 Mcps to 125 Mcps. The quencher is optimized for the SPAD with a capacitance of 150 fF in the HV CMOS technology used. Using our recently published photon detection probability (PDP) model and fitting it to measured results up to a PDP of 68.8% at 9.9 V excess bias from our previous tapeout, a peak PDP of 90.1% (saturation PDP) at 650 nm for VEX=17.9 V is estimated and a PDP over 50% at 850 nm comes into reach for the same excess bias voltage. To the authors’ best knowledge, PDP saturation has never been reached before for an integrated SPAD.
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