硅-硼体系状态的电子密度

Y. Imai, M. Mukaida, M. Ueda, A. Watanabe, K. Kobayashi, T. Tsunoda
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引用次数: 0

摘要

为了了解Si-B合金B/sub 3/Si或B/sub 4/Si, B/sub 6/Si, B/sub n/Si和/spl β /-菱形硼(/spl β /-B)的热电性能,尝试使用第一性原理赝势法进行能带计算。对于P-B,需要部分占据间隙位点来解释在导带和价带间隙之间产生局域水平。可以预测B/sub 3/Si(或B/sub 4/Si)的半导体性质。B/sub 6/Si在费米能级上具有确定的DOS值。原子无序排列引起的波函数的局域化对其电子性质起着至关重要的作用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Electronic densities of states of Silicon-Boron system
In order to understand thermoelectric properties of Si-B alloys B/sub 3/Si or B/sub 4/Si, B/sub 6/Si, B/sub n/Si and /spl beta/-rhombohedral boron (/spl beta/-B), band-calculations have been attempted using a first-principle pseudopotential method. For P-B, partial occupancy of interstitial sites would be required to explain the generation of localized levels between the gap of the conduction band and valence band. Semiconducting nature of B/sub 3/Si (or B/sub 4/Si) could be predicted. B/sub 6/Si has definite DOS values at its Fermi level. The localization of the wavefunction by disordered arrangement of the atoms would play an essential role for its electronic properties.
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