{"title":"GaN HEMT器件的功率循环可靠性结果","authors":"J. Franke, Guang Zeng, Tom Winkler, J. Lutz","doi":"10.1109/ISPSD.2018.8393704","DOIUrl":null,"url":null,"abstract":"The GaN HEMT is a novel wide bandgap device which could improve the overall efficiency and at the same time shrink the system size. In order to verify the reliability of this promising semiconductor device, new measurement and testing methods have to be developed. In this work, as a general basis for performing reliability tests junction temperature measurement methods for GaN HEMT were investigated. By using suitable temperature measurement method, several power cycling tests were performed on GaN HEMT from three different manufacturers. The main failure mechanism of the GaN HEMT from two manufacturers under power cycling tests is the degradation of solder layer between device and printed circuit board. The main failure mechanism of the devices from the third manufacturer is bond wire lift-off. In GaN the piezoelectric effect is involved in the formation of the 2DEG, and electrical characteristics are sensitive to compressive and tensile stress. The question is whether repetitive deformation leads to new failure mechanisms compared to Si devices.","PeriodicalId":166809,"journal":{"name":"2018 IEEE 30th International Symposium on Power Semiconductor Devices and ICs (ISPSD)","volume":"9 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2018-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"34","resultStr":"{\"title\":\"Power cycling reliability results of GaN HEMT devices\",\"authors\":\"J. Franke, Guang Zeng, Tom Winkler, J. Lutz\",\"doi\":\"10.1109/ISPSD.2018.8393704\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The GaN HEMT is a novel wide bandgap device which could improve the overall efficiency and at the same time shrink the system size. In order to verify the reliability of this promising semiconductor device, new measurement and testing methods have to be developed. In this work, as a general basis for performing reliability tests junction temperature measurement methods for GaN HEMT were investigated. By using suitable temperature measurement method, several power cycling tests were performed on GaN HEMT from three different manufacturers. The main failure mechanism of the GaN HEMT from two manufacturers under power cycling tests is the degradation of solder layer between device and printed circuit board. The main failure mechanism of the devices from the third manufacturer is bond wire lift-off. In GaN the piezoelectric effect is involved in the formation of the 2DEG, and electrical characteristics are sensitive to compressive and tensile stress. The question is whether repetitive deformation leads to new failure mechanisms compared to Si devices.\",\"PeriodicalId\":166809,\"journal\":{\"name\":\"2018 IEEE 30th International Symposium on Power Semiconductor Devices and ICs (ISPSD)\",\"volume\":\"9 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2018-05-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"34\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2018 IEEE 30th International Symposium on Power Semiconductor Devices and ICs (ISPSD)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ISPSD.2018.8393704\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2018 IEEE 30th International Symposium on Power Semiconductor Devices and ICs (ISPSD)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISPSD.2018.8393704","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 34
摘要
GaN HEMT是一种新型的宽禁带器件,在提高整体效率的同时缩小了系统尺寸。为了验证这种有前途的半导体器件的可靠性,必须开发新的测量和测试方法。在这项工作中,作为进行可靠性测试的一般基础,研究了GaN HEMT的结温测量方法。采用合适的温度测量方法,对三家不同厂家的GaN HEMT进行了多次功率循环测试。在功率循环测试中,两家厂商的GaN HEMT的主要失效机制是器件与印刷电路板之间的焊料层退化。第三家厂家生产的设备的主要失效机制是焊线脱落。在氮化镓中,压电效应参与了2DEG的形成,并且电特性对压应力和拉应力敏感。问题是,与硅器件相比,重复变形是否会导致新的失效机制。
Power cycling reliability results of GaN HEMT devices
The GaN HEMT is a novel wide bandgap device which could improve the overall efficiency and at the same time shrink the system size. In order to verify the reliability of this promising semiconductor device, new measurement and testing methods have to be developed. In this work, as a general basis for performing reliability tests junction temperature measurement methods for GaN HEMT were investigated. By using suitable temperature measurement method, several power cycling tests were performed on GaN HEMT from three different manufacturers. The main failure mechanism of the GaN HEMT from two manufacturers under power cycling tests is the degradation of solder layer between device and printed circuit board. The main failure mechanism of the devices from the third manufacturer is bond wire lift-off. In GaN the piezoelectric effect is involved in the formation of the 2DEG, and electrical characteristics are sensitive to compressive and tensile stress. The question is whether repetitive deformation leads to new failure mechanisms compared to Si devices.