基于开关的45nm轻掺杂和重掺杂CMOS衬底电流评估

Sanjay Sharma, R. P. Yadav, V. Janyani
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引用次数: 0

摘要

模拟和数字电路的集成是混合信号电路设计中的一个重要问题。数字端的开关活动广泛地影响模拟电路。本文介绍了数字电路中由开关活动引起的衬底电流的产生和变化,以及衬底电流随开关频率的变化规律。被测电路为45nm工艺节点的CMOS逆变器。电路由虚拟制造的NMOS和PMOS器件组成,器件使用ATHENA工艺模拟器制作,然后在MixedMode下实现和评估电路。对轻掺杂和重掺杂CMOS逆变器进行了瞬态仿真,绘制了不同输入脉冲下的基片电流。随着开关频率的增加,衬底电流增加,这适用于轻掺杂和重掺杂的CMOS。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Switching based evaluation of substrate current in lightly and heavily doped CMOS at 45nm
Integration of analog and digital circuits is a vital design issue in mixed signal circuits. Switching activity at the digital end widely affects the analog circuitry. This paper presents the generation and variation of substrate current due to the switching activity in a digital circuit and also how the substrate current varies with the switching frequency. The circuit under test is a CMOS inverter at 45nm technology node. Circuit is made up of virtually fabricated NMOS and PMOS devices, the devices are made using ATHENA process simulator and the circuit is then implemented and evaluated in MixedMode. Transient simulation is performed and then substrate current is plotted with respect to two different input pulses for lightly doped and heavily doped substrate CMOS inverter. As the switching frequency increases the substrate current increases, this is applicable for both the lightly and heavily doped CMOS.
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