用于亚阈值区域ALU的1位FinFET全加法器单元的设计与实现

Aqilah Binti Abdul Tahrim, M. Tan
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引用次数: 11

摘要

研究了基于FinFET的全加法器在各种电池设计中的性能和能量效率。此外,FinFET全加法器在亚阈值区域的性能显示了低功耗技术的显著成果。基于1位FinFET的全加法器设计了四种不同的单元设计,同时根据所使用的晶体管类型,即传统场氧化晶体管(MOSFET)和FinFET,分析了所有四种拓扑结构的平均功耗、延迟、功率延迟积(PDP)和能量延迟积(EDP)。基于这项研究,基于FinFET的全加法器显示,与传统FET相比,延迟平均降低94%,功耗降低97%,PDP和EDP均降低99%,从而使FinFET在能效方面具有优势。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Design and implementation of a 1-bit FinFET Full Adder cell for ALU in subthreshold region
The FinFET based Full Adder in various cell designs is investigated in terms of performance and energy efficiency. Additionally, the performance of the FinFET Full Adder in the subthreshold region reveals significant results in low power technology. The 1-bit FinFET based Full Adder is designed in four different cell designs, and while the average power dissipated, delays, power-delay-product (PDP) and energy-delay-product (EDP) of all four topologies were analyzed based on the types of transistors used i.e. conventional Field Oxide Transistor (MOSFET) and FinFET. Based on this study, FinFET based Full Adder shows an average of 94 % reduction in delay, 97 % reduction in power dissipation and 99 % reduction for both PDP and EDP over the conventional FET, giving FinFET advantages in energy efficiency.
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