{"title":"使用现场产生的氟实现绿色:CVD工艺的可持续清洗剂","authors":"P. Stockman, Greg Shuttleworth","doi":"10.1109/ASMC.2009.5155996","DOIUrl":null,"url":null,"abstract":"On-site generated fluorine meets the sustainability requirements for the future of CVD thin-film process chamber cleaning. Rigorous industry safety standards are maintained, GWP and total carbon footprint impacts are greatly reduced, and significant process improvements are available.","PeriodicalId":184890,"journal":{"name":"2008 International Symposium on Semiconductor Manufacturing (ISSM)","volume":"14 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2008-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Going green with on-site generated fluorine: Sustainable cleaning agent for CVD processes\",\"authors\":\"P. Stockman, Greg Shuttleworth\",\"doi\":\"10.1109/ASMC.2009.5155996\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"On-site generated fluorine meets the sustainability requirements for the future of CVD thin-film process chamber cleaning. Rigorous industry safety standards are maintained, GWP and total carbon footprint impacts are greatly reduced, and significant process improvements are available.\",\"PeriodicalId\":184890,\"journal\":{\"name\":\"2008 International Symposium on Semiconductor Manufacturing (ISSM)\",\"volume\":\"14 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2008-10-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2008 International Symposium on Semiconductor Manufacturing (ISSM)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ASMC.2009.5155996\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2008 International Symposium on Semiconductor Manufacturing (ISSM)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ASMC.2009.5155996","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Going green with on-site generated fluorine: Sustainable cleaning agent for CVD processes
On-site generated fluorine meets the sustainability requirements for the future of CVD thin-film process chamber cleaning. Rigorous industry safety standards are maintained, GWP and total carbon footprint impacts are greatly reduced, and significant process improvements are available.
求助内容：
应助结果提醒方式：
京公网安备 11010802042870号
