基于简易TTSV结构的3D集成电路散热研究

Debika Chaudhuri, Dalia Nandi Das, H. Rahaman, Tamal Ghosh
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引用次数: 1

摘要

为了摆脱传统平面集成设计的各种因素和局限性,三维集成似乎是当今时代替代签名的最佳方法之一。但是,热问题是制约这些新兴集成技术广泛应用、进一步发展和进步的主要因素。通过热透硅通孔(TTSV)冷却来减少3D集成电路内产生的热量是公认的最佳技术之一。本文旨在为TTSV的设计提供一些现实的规范,以便有效地管理热减排。本文还讨论了热点对准问题的温度相关结果,并对不同TTSV外层材料的热点对准问题进行了比较,同时利用了三维集成电路有源层内产生的时间相关温度波动。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Heat Mitigation in 3D ICs by Improvised TTSV Structure
To get rid of the diverse factors and limitations originated in the conventional planer integration design, 3-dimensional (3D) integration seems to be one of the best replacing signatures in current era. But, thermal issues are the major constraint for the wide spread application, further growth and advancement to these highly budding integration techniques. To reduce the generated heat within the 3D IC cooling through the thermal through silicon via (TTSV) is one of the best possible recognized techniques. This paper is intended to provide some realistic regulation to the design of TTSV for effective management thermal heat mitigation. The temperature dependent results for the hotspot alignment issues are also discussed and compared for different TTSV outer materials along with the utilization of time dependent temperature fluctuation generated within the 3D IC active layers.
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