结合微立体光刻和厚抗蚀剂UV光刻技术进行三维微加工

A. Bertsch, H. Lorenz, P. Renaud
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引用次数: 78

摘要

本文提出了一种实现真正三维聚合物结构的新方法。它包括在后处理微立体光刻步骤中,通过平面工艺(如薄膜,大块硅蚀刻或高纵横比结构(LIGA, RIE,厚抗蚀剂)在微部件上添加3D聚合物微结构。这样,平面技术的一些形状限制可以得到新的功能应用。在预定义的结构上直接处理微立体光刻可以防止与分离部件的微组装相关的操作。为了演示这种微结构工艺的组合,给出了一个例子,展示了在SU-8齿轮上通过微立体光刻增加的圆锥轴。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Combining microstereolithography and thick resist UV lithography for 3D microfabrication
A new approach for the realization of true 3D polymer structures is presented in this paper. It consists in adding, in a post-processing microstereolithography step, 3D polymer microstructures on top of a micropart patterned by means of planar processes such as thin films, bulk silicon etching or high aspect ratio structuration (LIGA, RIE, thick resist). This way, some shape limitations of the planar technologies can be the new functional applications. Direct processing of microstereolithography on predefined structures prevents manipulations which are associated with microassembly of separated parts. To demonstrate this combination of microstructuration processes, an example showing a conical axle added by microstereolithography on a SU-8 piece of gearing is presented.
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