信号裕度测试,以确定在低温下与DRAM可靠性和功能相关的工艺灵敏度

E. Nelson, Y. Li, D. Poindexter, M. Ruprecht, E. Lim, Y. Matsubara, H. Sawazaki, Q. Ye, M. Iwatake, W. Tonti
{"title":"信号裕度测试,以确定在低温下与DRAM可靠性和功能相关的工艺灵敏度","authors":"E. Nelson, Y. Li, D. Poindexter, M. Ruprecht, E. Lim, Y. Matsubara, H. Sawazaki, Q. Ye, M. Iwatake, W. Tonti","doi":"10.1109/IRWS.1999.830551","DOIUrl":null,"url":null,"abstract":"With high aspect ratio, tight spacing, small line widths, and low supply voltages associated with the scaling of the DRAM cell, signal for the sense amplifier becomes weaker for each new DRAM generation. We have developed a signal margin testing methodology capable of identifying process sensitivities relevant to DRAM functionality and reliability at low temperatures. This paper describes the test methodology and discusses the benefits derived from applying this method to 256M DRAM product development.","PeriodicalId":131342,"journal":{"name":"1999 IEEE International Integrated Reliability Workshop Final Report (Cat. No. 99TH8460)","volume":"135 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1999-10-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Signal margin test to identify process sensitivities relevant to DRAM reliability and functionality at low temperatures\",\"authors\":\"E. Nelson, Y. Li, D. Poindexter, M. Ruprecht, E. Lim, Y. Matsubara, H. Sawazaki, Q. Ye, M. Iwatake, W. Tonti\",\"doi\":\"10.1109/IRWS.1999.830551\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"With high aspect ratio, tight spacing, small line widths, and low supply voltages associated with the scaling of the DRAM cell, signal for the sense amplifier becomes weaker for each new DRAM generation. We have developed a signal margin testing methodology capable of identifying process sensitivities relevant to DRAM functionality and reliability at low temperatures. This paper describes the test methodology and discusses the benefits derived from applying this method to 256M DRAM product development.\",\"PeriodicalId\":131342,\"journal\":{\"name\":\"1999 IEEE International Integrated Reliability Workshop Final Report (Cat. No. 99TH8460)\",\"volume\":\"135 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1999-10-18\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"1999 IEEE International Integrated Reliability Workshop Final Report (Cat. No. 99TH8460)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IRWS.1999.830551\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"1999 IEEE International Integrated Reliability Workshop Final Report (Cat. No. 99TH8460)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IRWS.1999.830551","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

摘要

由于高宽高比、紧凑的间距、小线宽和与DRAM单元的缩放相关的低电源电压,对于每一代新的DRAM,用于感测放大器的信号变得更弱。我们开发了一种信号裕度测试方法,能够识别与低温下DRAM功能和可靠性相关的工艺灵敏度。本文介绍了测试方法,并讨论了将该方法应用于256M DRAM产品开发的好处。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Signal margin test to identify process sensitivities relevant to DRAM reliability and functionality at low temperatures
With high aspect ratio, tight spacing, small line widths, and low supply voltages associated with the scaling of the DRAM cell, signal for the sense amplifier becomes weaker for each new DRAM generation. We have developed a signal margin testing methodology capable of identifying process sensitivities relevant to DRAM functionality and reliability at low temperatures. This paper describes the test methodology and discusses the benefits derived from applying this method to 256M DRAM product development.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信