{"title":"拉伸应变条件对锗基注入激光器掺杂密度要求的影响","authors":"O. Aldaghri, Z. Ikonić, R. Kelsall","doi":"10.1109/GROUP4.2011.6053746","DOIUrl":null,"url":null,"abstract":"The doping density required for filling the indirect valleys up to the direct valley in Ge bulk and quantum wells under various tensile-strain conditions is investigated, and the optimum cases for Ge lasers identified.","PeriodicalId":141233,"journal":{"name":"8th IEEE International Conference on Group IV Photonics","volume":"317 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2011-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"The effects of tensile-strain conditions on doping density requirements for Ge-based injection lasers\",\"authors\":\"O. Aldaghri, Z. Ikonić, R. Kelsall\",\"doi\":\"10.1109/GROUP4.2011.6053746\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The doping density required for filling the indirect valleys up to the direct valley in Ge bulk and quantum wells under various tensile-strain conditions is investigated, and the optimum cases for Ge lasers identified.\",\"PeriodicalId\":141233,\"journal\":{\"name\":\"8th IEEE International Conference on Group IV Photonics\",\"volume\":\"317 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2011-11-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"8th IEEE International Conference on Group IV Photonics\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/GROUP4.2011.6053746\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"8th IEEE International Conference on Group IV Photonics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/GROUP4.2011.6053746","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
The effects of tensile-strain conditions on doping density requirements for Ge-based injection lasers
The doping density required for filling the indirect valleys up to the direct valley in Ge bulk and quantum wells under various tensile-strain conditions is investigated, and the optimum cases for Ge lasers identified.