一个160mW 65GHz的Gunn二极管

T. Hisatsugu, S. Yamamura, S. Yokogawa, Y. Hirachi, A. Miura, A. Shibatomi
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引用次数: 2

摘要

利用ga - ascl3 - n2气相外延生长的晶片,在毫米波区制备了大功率砷化镓二极管。计算机模拟和实验结果表明,采用渐进式衬底接口晶片可以提高激光二极管在55GHz以上频率下的输出功率。采用金刚石散热器的gunn二极管在50ghz至60ghz频率范围内提供220mW连续波输出功率,效率为3.5%,在65GHz频率范围内提供160mW输出功率,效率为3%。在最大输出功率工作条件下,gunn二极管在小于150°C的体温升下工作。65GHz稳定炮振荡器在离载波1MHz时的调幅噪声(N/C) ssbw为-165/1Hz BW。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A 160mW 65GHz Gunn diode
High power GaAs gunn diodes, which were made from wafers grown by Ga-AsCl3-N2vapor phase epitaxy, have been developed in the millimeter wave region. It was clear by the computer simulations and the experiments that the output power of gunn diodes at a frequency above 55GHz has been improved by using gradual substrate interface wafers. The gunn diodes, with a diamond heat sink delivered 220mW cw output power with 3.5% efficiency in the frequencies from 50 GHz to 60 GHz and 160mW with 3% efficiency at 65GHz. The gunn diodes operated at a bulk temperature rise of less than 150°C in a maximum output power operating condition. The AM noise (N/C)SSBof the 65GHz stabilized gunn oscillator was -165/1Hz BW at 1MHz off the carrier.
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