Mcm-D应用中的边界扫描技术

S. C. Hilla
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引用次数: 2

摘要

多芯片模块(mcm)的发展在测试领域面临着许多挑战。本文详细介绍了这些挑战的解决方案,从而成功开发了晶圆规模的硅上硅多芯片模块。最终产品是安装在SEM-E框架上的4英寸硅衬底。SEM-E模块设计用于执行图像处理,是组成高性能图像处理计算机的众多模块之一。通过广泛使用边界扫描来执行互连测试和功能测试,晶圆级MCM被插入目标系统机架并首次正常工作。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Boundary Scan Techniques in an Mcm-D Application
The development of multichip modules (MCMs) is confronted by many challenges in the area of testing. This paper details the solutions to some of these challenges which resulted in the successful development of a wafer scale, silicon-on silicon multichip module. The end product is a 4" silicon substrate mounted on a SEM-E frame. The SEM-E module was designed to perform image processing and is one of many modules making up a high performance image processing computer. Through the extensive use of boundary scan to perform both interconnect testing and functional testing, the wafer scale MCM was inserted into the target system rack and worked correctly the first time.
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