梯度沟道SOI mosfet阈值电压的二维解析模型

Varun Goel, Sanjay Sharma, Sanjay Kumar, S. Jit
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引用次数: 4

摘要

本文提出了完全耗尽的梯度沟道绝缘子上硅(SOI) mosfet阈值电压的二维解析模型。利用合适的边界条件,用抛物型近似求解了不同通道区域的二维泊松方程。研究了不同器件参数对器件性能的影响。结果证实,与传统的SOI mosfet相比,渐变沟道结构具有更好的抗短沟道效应(SCEs)的能力。通过将解析模型结果与市售二维器件模拟器ATLAS的仿真结果进行比较,验证了模型的准确性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Two-dimensional analytical model for threshold voltage of graded-channel SOI MOSFETs
This paper presents a two-dimensional (2D) analytical model for threshold voltage of fully depleted graded-channel silicon-on-insulator (SOI) MOSFETs. The two-dimensional Poisson's equation is solved in different channel regions with parabolic approximation by using suitable boundary conditions. The effect of different device parameters on device performance has been studied. Results confirmed that a graded-channel structure gives better immunity against Short-Channel-Effects (SCEs) in comparison to conventional SOI MOSFETs. The accuracy of the model is verified by comparing the analytical model results with the simulation results obtained by commercially available two-dimensional device simulator, ATLAS.
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