辐射传感用CdS/CdTe器件的制备与表征

H. Shams, H. Abou Gabal, S. Soliman, S. Ebrahim, S. Agamy
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摘要

已经应用了几种技术来测量电离辐射。大多数这种技术都是昂贵和非常复杂的。我们的研究重点是化学沉积CdS以形成与CdTe结的x射线传感器。CdTe已被电沉积到CdS/FTO玻璃基板上,形成先前制造的CdS层厚度为4µm。通过恒电位器测量研究了CdTe沉积的最佳电势,结果表明-1.3为最佳工作电势。xrd分析表明,CdTe薄膜具有高取向晶体,具有优先取向的立方相锌共混物(111)。带隙Eg外推为1.4 eV。四个堆叠的传感器串联起来测量设备的性能。结果表明,FTO/CdS/CdTe/Mo探测器暴露在33 keV、1mA强度的x射线下产生的脉冲幅值为1.03 V。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Preparation and Characterization of CdS/CdTe Device for Radiation Sensing
Several Techniques had been applied to measure Ionizing Radiation. Majority of thistechniques are costly and very complicated. We focus on this research to chemically deposition of CdS to formwith CdTe junction x-ray sensor. CdTe has been electrodeposited onto CdS/FTO glass substrate to formwith previously fabricated CdS layer 4 µm thickness. The optimum potential for CdTe deposition hasbeen studied by potentiostat measurement, it shows that -1.3 is the optimum working potential. The XRDanalysis showed that the CdTe films have highly oriented crystallites with the cubic phase zinc blend withpreferred orientation (111). The band gap Eg extrapolated to be 1.4 eV. Four stacked sensors wereconnected in series to measure the device performance. It was observed that amplitude of the pulseformed due to exposed FTO/CdS/CdTe/Mo detector to X-ray of 33 keV and 1mA intensity is 1.03 V.
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