快速重离子修饰的GeOx薄膜及GeO/SiO2异质结构的发光性能

S. Cherkova, V. Volodin, V. Skuratov, M. Stoffel, H. Rinnert, M. Vergnat
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引用次数: 0

摘要

研究了在167mev的氙离子照射下,GeOx薄膜和GeO/SiO2多层异质结构的发光和结构特性。我们报告了在室温下可见范围内的强光致发光,这很可能是由于锗相关缺陷引起的辐射跃迁。在沉积态和辐照态结构中均观察到~0.8 eV ~ ~1.2 eV的红外发光带,这可能与GexSiyO2玻璃和Si衬底中的缺陷或缺陷配合物有关。结果表明,快速重离子辐照并没有导致亚氧化锗纳米团簇和GeO2的相分离,而是导致了GeO/SiO2层的混合,形成了Ge-O-Si键。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Luminescent properties of GeOx thin films and GeO/SiO2 heterostructures modified with swift heavy ions
The luminescent and structural properties of GeOx thin films and GeO/SiO2 multilayer heterostructures, irradiated with 167 MeV Xe ions with fluencies up to 1013 cm−2 , were studied. We report strong photoluminescence in visible range at room temperature, which is most probably due to Ge-related defect-induced radiative transitions. And infrared luminescence bands (from ~0.8 eV to ~1.2 eV) were observed in as-deposited and irradiated structures, which can be related to defects or defects complexes in GexSiyO2 glass and partially in Si substrate. It was shown that swift heavy ion irradiation does not lead to the expected phase separation of germanium suboxide into germanium nanoclusters and GeO2, but causes the intermixing of GeO/SiO2 layers with the formation of Ge-O-Si bonds.
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