低电流直流真空电弧中的电压散列

M. Hoyaux, C. Kimblin
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引用次数: 13

摘要

研究了铜汽弧阳极区高压脉冲的性质和产生机理。电弧在直径1.3 cm的阳极和直径5 cm的阴极之间,直流范围为30- 400a。在阳极斑点形成之前和恒流下,电弧电压表现出叠加在直流电压上的高频脉冲。这些脉冲的重复幅度和频率(= 500 kHz)是高度不稳定的,总的不稳定性表现为电压散列。哈希振幅随电弧电流和触点间距的增加而增加,在2.5 cm时,哈希振幅从30 A时的几十伏到400 A时的几百伏不等。该散列归因于阳极区域蒸汽和等离子体密度的波动。虽然这些波动看起来与阴极斑点的总体运动无关,但条纹照片表明阴极随时间变化的蒸发可能导致散列现象。根据荧光灯阳极区域散列的经验,提出了第二种促进机制,涉及阳极的准周期性发射。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Voltage Hash in Low-Current DC Vacuum Arcs
The nature and mechanism of the high-voltage pulses in the anode region of copper-vapor arcs have been investigated. Arcs are drawn between a 1.3-cm-diameter anode and a 5-cm-diameter cathode in the dc range of 30-400 A. Prior to anode spot formation and at constant current, the arc voltage exhibits HF pulses superposed on the dc voltage. The amplitude and frequency of repetition (= 500 kHz) of these pulses is highly erratic, and the total instability is evidenced as voltage hash. The hash amplitude increase with both arc current and contact spacing and, at 2.5 cm, varies from several tens of volts at 30 A to several hundreds of volts at 400 A. The hash is attributed to fluctuations in vapor and plasma density in the anode region. Although these fluctuations appear unrelated to the gross motion of the cathode spots, streak photographs indicate a time-variant cathode evaporation that may contribute to the hash phenomenon. A second contributory mechanism is suggested from experience of hash in the anode region of fluorescent lamps, and involves quasi-periodic emission from the anode.
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