细间距金丝球键合热超声参数分析与优化

Arthur Lutckmeier Bohn, Cassiano Silva de Campes, R. D. de Figueiredo, S. Rigo
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引用次数: 0

摘要

半导体发展史的主要特征之一是它们的规模缩小,有效地缩短了I/O电垫之间的距离。金丝球键合是半导体封装的标准,其参数的优化至关重要。本研究采用3个关键参数作为输入,2个测量值作为输出,在5个水平的全析因实验设计中,后来外推到9个水平的数学模型进行详细分析。开发了适应度函数来根据输入找到最佳的整体结果,因为两个输出是成比例的,但相反(由于剪切阻力增加,因此不希望增加粘合直径)。该函数在48 μm宽的焊盘上返回直径为40.27μm的键,在20.32 μm (0.8 mils)的导线上产生15.43 gf的剪切阻力,两者都是理想的。后来进行了氢氧化钾蚀刻,以验证该方法最佳结果的物理含义,其中发现了所有所需的金属间特性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Analysis and Optimization of Fine-Pitch Gold Wire Ball Bonding Thermosonic Parameters
One of the main characteristics of semiconductors' history is their scale reduction, effectively shortening the distances between I/O electrical pads. Gold wire ball bonding is a standard in semiconductor packaging and the optimization of its parameters is essential. This study employed the use of three key parameters as input and two measurements as output in a 5-level Full Factorial Design of Experiments, later extrapolated to a 9-level mathematical model for detailed analysis. A fitness function was developed to find the best overall results based on the inputs, as the two outputs are proportional but inversely desired (as the shear resistance desirably increases, so increases the bond diameter, undesirably). This function returned bonds with 40.27μm in diameter on a 48 μm wide pad and 15.43 gf in shear resistance from a 20.32 μm (0.8 mils) wire, both desirable. Potassium Hidroxide etching was later performed to validate the physical implications from the method's best results, where all the desired intermetallic characteristics were found.
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