用紫外激光清洗产生抗粘附二氧化硅玻璃表面

1996 Conference on Optoelectronic and Microelectronic Materials and Devices. Proceedings Pub Date : 1996-12-08 DOI:10.1109/COMMAD.1996.610168

D.R. Hafpenny, D. Kane, R. Lamb, B. Gong

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引用次数: 3

摘要

利用倍频铜蒸气激光器的紫外照射，在激光清洗的影响范围内，可以改变二氧化硅的表面化学性质。分析表明，在紫外光的作用下，表面被去羟基化，使其从亲水性变为疏水性。对于0.3 /spl μ l /m直径的颗粒，在随后的表面污染后，表面改性具有减少附着在处理表面上的颗粒数量高达80%的效果。

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Creation of adhesion resistant silica glass surfaces with ultraviolet laser cleaning

By using the ultraviolet irradiation from a frequency doubled copper vapour laser, in the fluence range used for laser cleaning, the surface chemistry of silica can be modified. Analysis has shown that the surface is dehydroxylated by the UV light changing it from hydrophilic to hydrophobic in nature. The modification of the surface has the effect of reducing the number of particles that adhere to the treated surface by up to 80%, for 0.3 /spl mu/m diameter particles, upon subsequent contamination of the surface.

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1996 Conference on Optoelectronic and Microelectronic Materials and Devices. Proceedings

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