{"title":"在太空中使用商用半导体技术","authors":"A. Johnston, C. Lee, B. Rax, D. Shaw","doi":"10.1109/RADECS.1995.509774","DOIUrl":null,"url":null,"abstract":"New issues are discussed that must be considered when unhardened commercial technologies are used in space applications, as well as hardness assurance techniques. Large differences in dose-rate effects were observed for different circuit types from the same manufacturer, which may be due to differences in the thickness of isolation oxides used in processing. Data are presented for scaled MOS devices that show how total dose hardness and hard error rates are projected as devices are scaled to smaller feature size. Hard errors are expected to be a significant problem for devices with feature size below 0.6 /spl mu/m.","PeriodicalId":310087,"journal":{"name":"Proceedings of the Third European Conference on Radiation and its Effects on Components and Systems","volume":"21 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1995-09-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"20","resultStr":"{\"title\":\"Using commercial semiconductor technologies in space\",\"authors\":\"A. Johnston, C. Lee, B. Rax, D. Shaw\",\"doi\":\"10.1109/RADECS.1995.509774\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"New issues are discussed that must be considered when unhardened commercial technologies are used in space applications, as well as hardness assurance techniques. Large differences in dose-rate effects were observed for different circuit types from the same manufacturer, which may be due to differences in the thickness of isolation oxides used in processing. Data are presented for scaled MOS devices that show how total dose hardness and hard error rates are projected as devices are scaled to smaller feature size. Hard errors are expected to be a significant problem for devices with feature size below 0.6 /spl mu/m.\",\"PeriodicalId\":310087,\"journal\":{\"name\":\"Proceedings of the Third European Conference on Radiation and its Effects on Components and Systems\",\"volume\":\"21 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1995-09-18\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"20\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings of the Third European Conference on Radiation and its Effects on Components and Systems\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/RADECS.1995.509774\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of the Third European Conference on Radiation and its Effects on Components and Systems","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/RADECS.1995.509774","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Using commercial semiconductor technologies in space
New issues are discussed that must be considered when unhardened commercial technologies are used in space applications, as well as hardness assurance techniques. Large differences in dose-rate effects were observed for different circuit types from the same manufacturer, which may be due to differences in the thickness of isolation oxides used in processing. Data are presented for scaled MOS devices that show how total dose hardness and hard error rates are projected as devices are scaled to smaller feature size. Hard errors are expected to be a significant problem for devices with feature size below 0.6 /spl mu/m.